CMOS Baseline

General Baseline Information	Baseline Reports	Members Only
Introduction NanoLab Memoranda NanoLab Contacts Baseline Engineers	Report VIII: 0.35 um CMOS Process on Six-Inch Wafers The First Baseline Run in the New Marvell NanoLab by A. Szucs Report VII: 0.35 um CMOS Process on Six-Inch Wafers by L. Petho Report VI: 0.35 um CMOS Process on Six-Inch Wafers by L. Petho & A. Pongracz Report V: 0.35 um CMOS Process on Six-Inch Wafers by A. Pongracz & G. Vida Report IV: 0.35 um CMOS Process on Six-Inch Wafers (pdf) by A. Horvath, S. Parsa, H.Y. Wong Report III: Six-Inch CMOS Baseline Process (pdf) by L. Voros, S. Parsa Report II: CMOS Baseline Process (pdf) by L. Voros Report I: CMOS Baseline Process (pdf) by S. Fang	CMOS 200 Process Log CMOS 190 Process Log CMOS 180 Process Log CMOS 170 Process Log
Four-Inch Runs	Six-Inch Runs	Graphics
CMOS 61: NVt, PVt, Resistivity CMOS 60: NVt, PVt, Resistivity CMOS 59: NVt, PVt, Resistivity CMOS 58: NVt, PVt, Resistivity	CMOS 190 (0.35 um) CMOS 180 (0.35 um with Mix&Match and STI) CMOS 170 (advanced 0.35 um) CMOS 161 (0.35 um) CMOS 150 (1.3 um)	Baseline Process Cross-section (pdf)

General Baseline Information

Baseline Reports

Members Only

Four-Inch Runs

Six-Inch Runs

Graphics

CMOS 190 (0.35 um)
CMOS 180 (0.35 um with Mix&Match and STI)
CMOS 170 (advanced 0.35 um)
CMOS 161 (0.35 um)
CMOS 150 (1.3 um)