Internship Participants

The NanoLab Intern Program is Limited to Berkeley High School Participants.

The NanoLab / Berkeley High School Intern Program Video,

UGIM2016 Presentation: The NanoLab High School Intern Program

Participants

	Participant	Project Title
2022	Aadi Weber, Berkeley High School, Berkeley, CA	Substrate Influence on Optimal ASML Process Settings
2022	Claudia Johnson, Berkeley High School, Berkeley, CA	Characterization of New Lam8 Monitor and Centura 3-5 Chamber
2021	Program not held due to COVID restrictions
2020	Program not held due to COVID restrictions
2019	Misako Dickinson, Berkeley High School, Berkeley, CA	Plasma Enhanced Chemical Vapor Deposition of Amorphous and Microcrystalline Silicon
2019	Rayna Carter, Berkeley High School, Berkeley, CA	Positive Photoresist Image Reversal Process
2018	Ayumi Namba, Berkeley High School, Berkeley, CA	Developing High Aspect Ratio Deep Reactive Ion Etch (DRIE) on STS2
2018	Lauren Spencer, Berkeley High School, Berkeley, CA	Measuring Local Stress Using Raman Spectroscopy
2017	Sarah (Sally) Robson, Berkeley High School, Berkeley, CA	AZ4620 Thick Photoresist Lithography and Etching Process
	Kyla Dangerfield, Berkeley High School, Berkeley, CA	Si02 Recipe for Oxford PECVD3
	Violet Buxton-Walsh, Berkeley High School, Berkeley, CA	Developing a Mobile Electrostatic Chuck (MESC)
2016	Julia Schwartz, Berkeley High School, Berkeley, CA	SiC on Oxford PECVD 4
	Sophie Phillips, Berkeley High School, Berkeley, CA	Adding the Safety Infraction page to MercuryWeb
	Renee Revolorio Keith, Berkeley High School, Berkeley, CA	Characterizing LiftOff Process Latititude at the UC Berkeley NanoLab
	Alam Figueroa Aguilar, 2016 Transfer to Excellence Research Program	Optimization of UV Stabilization Processes for Critical Dry Etch Applications
2015	Rachel Barcklay, Berkeley High School, Berkeley, CA	Calculating Specialty Materials Usage Accurately: an Improved Algorithm and a Regression Series Mapping Voltage to Flow Rates
	Francesca Calderon, Miramonte High School, Orinda, CA	Critical Dimension Enhancement of DUV Photolithography on the ASML 5500/300
	Irving Garduno, 2015 Transfer to Excellence Research Program	Optimization of Patterned Thin Films of Photoresist for Plasma Etching Applications
	Anjali Walia, Irvington High School, Fremont, CA	Optical Emission Analysis of CF4/CHF3/Ar Plasma Etch of Oxide
	Anushka Walia, Irvington High School, Fremont, CA	Optical Emission Analysis of BCl3/Cl2 Plasma Etch of W, Al, and Ti Thin Films
	Intern Pictures
2014	Nishtha Bhatia, Washigton High School, Fremont, CA	i-Line Photoresist Development at the Marvell Nanofabrication Laboratory: Validation of New Standard i-Line Photoresist OiR 906-12
	Kevin Crabbe, 2014 Transfer to Excellence Research Program	Investigation of a Spin-on Dielectric as an Interlayer Dielectric for the Marvell Nanofabricaiton Laboratory CMOS210
	Samantha Wong, Lowell High School, San Francisco, CA	SiO2 Characterization
2013	Anjali Majumdar, Miramonte High School, Orinda, CA	UV26-3.0 Thick Positive DUV Photoresist
	Katie Neff, Castro Valley High School, Castro Valley, CA	Use of Cross-Platform Metrology Techniques to Investigate the Marvell Nanofabrication Laboratory Etch Quality Monitoring Program
	Nova Ng, Saratoga High School, Saratoga, CA	Front and back-end development of a new website for one of the recharge centers
2012	Ruby Spring, Berkeley High School, Berkeley, CA	tystar5 characterization
	Wen Ye Wendy Li, Albany High School, Albany, CA	Qualify CHA metal deposition through measuring contact resistance, sheet resistance and reflectance. 2.Create test wafers for measuring the contact resistance of certain metals deposited by the CHA
	Taylor Lyberger, Palos Verdes Peninsula High School	Test Axcelis UV-Oven Check 4 types of photoresist Std. I-line, Std. G-line, DUV, Thick PR On Si, Ox, Al, Poly wafers
2011	Marie Lu, Campolindo High School, CA	Oxford2 Silicon Nitride Recipe Development
2011	Kate Obrien, Talmapais High School, CA	Surface modification using organic single atomic monolayers
2009	Anjana Bala, Mission San Jose High School, CA	Characterizing Aluminum Uniformity Using Resistance
	Sarah Ip, Mills High School, CA	Comparison of Thin-Film Aluminum Deposition
	Christopher McNally, Diablo Valley College, CA	Taurus and Hydra Systems
2008	Kelsey Brokaw Oslo, International School, Norway	Chemical mechanical polishing process development
2008	Alice Wong, College Preparatory School, Oakland, CA	Via Fill in Small Trenches using Hot Aluminum Process
2007	Carolyn Kooi, College Preparatory School, Oakland, CA	Uniformity Characterization of Technics-c
2007	Emmeline Lan, Irvington High School, Fremont, CA	CPA: Al Thickness vs. Sheet Resistance
2006	Sonia Ganju, Notre-Dame High School, Belmont, CA	Wafer Resistance Uniformity Tests For Edwards Sputtering System
2006	Andrea Imhof, University High School, San Francisco, CA
2005	Subha Gollakota, Harker High School, San Jose, CA	Microlab Website
2003	Bonny McKeon, Bishop High School, Bishop, CA	Characterization of Boron Diffusion from Boron+Source Wafers
2001	Chi Sum (Crystal) Chan, Washington High School, San Francisco, CA
	Erin Hsu, Thurgood Marshall High School, San Francisco, CA
	Brianne Madison, Vallejo High School, Vallejo, CA