Nanolab has extensive thin film vapor deposition capabilities. Our Physical Vapor Deposition options include magnetron sputtering (RF, DC, and HIPIMS), thermal evaporation, and electron-beam evaporation. Our Chemical Vapor Deposition(CVD) capabilities include Atomic Layer Deposition (ALD) , Plasma Enhanced CVD (PECVD) and Epitaxial Si and SiGe deposition. We also have some unique capabilities such as Diamond film CVD.
Equipment Manual
6. Thin Film Systems
Vacuum Class
6.00 (vacuumclass) Vacuum Basics Class
Sputterers
6.12 (aln2) Endeavor AT
6.13 (ast-sputter) Multi Target Co-Sputtering System
6.14 (mrc943) MRC Sputtering System for Superconducting Films
6.15 (mrc944) MRC Sputtering System with Sputter-Etch
6.17 (oxfordpvd1) Oxford Plasmalab System100 Sputter Chamber 1
6.19 (sem-coater) SEM Sample Preparation Sputterer
6.20 (semicore) Pro450 Multi-Target Co-Sputter with Load Lock
Evaporator
6.31 (evapclass) Evaporator Training Class
6.32 (ast-ebeam) AST Electron Beam Dielectric Deposition
6.33 (cha) CHA Solution E-Beam Evaporator
6.34 (ebeam1) Electron Beam 10 kW 6-pocket Evaporator
6.35 (nrc) NRC Evaporator
6.36 (ultek2) Ultek2 Angled Cooled Chuck E-Beam Evaporator
Atomic Layer Deposition
6.40 ALD Overview Chart
6.41 (cambridge) Cambridge ALD Deposition System
6.42 (picosun) Picosun Atomic Layer Deposition (ALD)
Chemical Vapor Deposition
6.51 (amatepi) Applied Materials Epi Si & Ge Deposition
6.53 (oxford2) Oxford Plasmalab 80plus PECVD System
6.54 (oxfordpecvd3) Oxford Plasmalab System 100 PECVD System
6.55 (oxfordpecvd4) Oxford Plasmalab System 100 PECVD System
6.56 (parylene) Parylene Deposition System 2010 Labcoater 2
6.57 (pqecr) Plasma Quest ECR PECVD System
6.58 (sp3) sp3 HFCVD Diamond Deposition Reactor
Process Manual
6. Thin Film Systems
6.3 (oxfordpecvd4) PECVD SiOx Deposition with 81MHz Power
6.4 (oxfordpecvd4) PECVD SixNy Deposition with 81MHz Power
6.5 (evapclass) NanoLab Precious Metal Melt and Target Policies
Process Specifications
6. Thin Film Systems
6.4 (mrc944) MRC944 Al/Si Deposition
6.22 (parylene) Parylene C Standard Deposition
6.24 (picosun) Picosun Al2O3 Deposition
6.25 (cambridge) Cambridge Fiji Al2O3 Deposition
6.51 (aln2) Aln2 PM1 Molybdenum Sputter Deposition
6.52 (aln2) Aln2 PM2 AlN Sputter Deposition
6.53 (aln2) Aln2 PM3 Aluminum Sputter Deposition
6.60 (oxfordpecvd3) Oxford PECVD3 - SiOx
6.61 (oxfordpecvd4) Oxford PECVD4 - SiOx
6.62 (oxfordpecvd4) Oxford PECVD4 - SixNy
6.63 (pqecr) PQECR- Oxide