Step 7.0 Resist strip and
clean
|
Steps |
Notes |
Date |
Operator |
|
|
7.1 |
Ash photoresist in oxigen
plasma (Matrix and Technics-C) |
11/26/03 |
Horvath |
|
|
7.2 |
Standard MEMS piranha
clean wafers in sink8 |
12/01/03 |
Horvath |
|
|
7.3 |
Measure ASML alignment
mark trenches with ASIQ: |
|||
|
Left |
Right |
|||
|
1. 1550 |
1530 |
|||
|
2. 1850 |
1850 |
|||
|
3. 1470 |
1430 |
|||
|
4. - |
- |
|||
|
5. 1460 |
1370 |
|||
|
6. 1440 |
1430 |
|||
|
7. 1890 |
1890 |
|||
|
8. 1860 |
1870 |
|||
|
9. 1810 |
1900 |
|||
|
10. 1690 |
1760 |
|||
|
11. 1450 |
1460 |
|||
|
12. 1430 |
1410 |
|||
|
13. 1910 |
1880 |
|||
|
14. 1860 |
1870 |
|||
|
15. 1700 |
1800 |
|||
|
Testw#1 |
2630 |
|||
|
Testw#2 |
1580 |
|||
|
Testw#3 |
1610 |
|||
|
Testw#4 |
|
|||
|
Testw#5 |
|
|||