Step 59. ILD oxide deposition
|
Steps |
Notes |
Date |
Operator |
|
59.1 |
P-5000, recipe AH_USG, 25
sec. deposition time (80A/sec, target=2000A) Film thickness on dummy: T= 2051A C= 2102A F= 2092A L= 2098A R= 2078A |
8/3/04 |
Horvath |