Step 53. Gate contact (M0) photo
|
Steps |
Notes |
Date |
Operator |
|
53.1 |
Standard DUV litho without
BARC: ASML: -
Energy-focus
matrix to determine best exposure settings -
Expose all
wafers with 39mJ at -1.3um focus offset Hard bake: Oven bake at
120C for 1hr |
07/12/04 |
Horvath |