Step 5.0 Zero layer photo
|
Steps |
Notes |
Date |
Operator |
|
|
|
|
|
|
5.1 |
Standard DUV litho with
BARC* Exposure energy 45 mJ/cm2,
Combi reticle Hard bake at 120 C for 60
min |
11/24/03* |
Horvath |
|
5.2 |
Final zero layer positions
in ASML FlexFET job: (-42.0; 3.0) (42.0; 3.0)
(3.0; 68.5) (3.0; -59.5) mm in wafer coordinates. Backup zero layer
positions: (-45.0; 3.0) (45.0; 3.0)
(0.0; 68.5) (0.0; -59.5) mm in wafer coordinates |
11/24/03 |
Horvath |
*: Litho steps for etching trials were made on 10/27/03, 10/29/03, 10/30/03, 11/04/03, 11/18/03. Those steps were standard DUV litho steps without BARC.