Step 47b. TiN plus Poly-Si
topgate deposition
|
Steps |
Notes |
Date |
Operator |
|
47b.1 |
Wafers # 2, 3, 6, 10, 14. TiN deposition in
Novellus: TiN600ST recipe (60 sec. dep. time) Poly-Si deposition in
Tystar16: 16SDPLYB, 40 min dep. time, target=600A Note: Poly deposition was
required on TiN because TiN film was not continuous on surface steps. |
6/15/04 and 6/19/04 |
Horvath |