Step 47a. Poly-Si topgate deposition
|
Steps |
Notes |
Date |
Operator |
|
47a.1 |
Right after the gate
oxidation. Wafers #5, 7, 9, 12, 13 Tystar10: 10SDPLYA, 25min dep time, target=500A |
6/14/04 |
Horvath |