Step 45. Sacrificial oxide strip and clean
|
Steps |
Notes |
Date |
Operator |
|
45.1 |
Try w#5 in 25/1 HF for 1
min. Looked good under SEM,
although applying the shorter time the better to prevent exposed TiSi2. -
Silicided
wafers: 35 sec 25/1 HF -
Implanted
wafers: 60 sec 25/1 HF |
6/13/04 |
Horvath |