Step 28. Resist strip and clean
|
Steps |
Notes |
Date |
Operator |
|
28.1 |
CMOS wafers only. Resist strip in Matrix O2
ash, 2 min. Cleaning: -
silicided S/D wafers: 5
min. PRS-3000 in sink5 -
implanted S/D wafers:
10 min piranha clean in sink8 |
05/05/04 |
Horvath |