Step 27. Wet etch PSG from PMOS regions
|
Steps |
Notes |
Date |
Operator |
|
27.1 |
CMOS wafers only. Sink 8, fresh 5/1 BHF Etch rate for PSG: ~ 4200A/min for
un-annealed ~ 2700A/min for annealed -
silicided S/D wafers: 10
sec etch time -
implanted S/D
wafers: 20 sec etch time |
05/05/04 |
Horvath |