Run Card for FlexFET process

Step 26. PMOS bottom gate and Vt adjust implants

Steps

Notes

Date

Operator

26.1

Triple implant on CMOS wafers (F# 3, 5, 6, 7, 9, 10) at Core Systems:

Wafer	Specie	Dose	Energy
Every wafer	Phosphorus	5E13	100
Every wafer	Antimony	1E14	195
F#3, 6, 7, 10	BF2	5E12	16
F#5, 9	BF2	1E13	16

Wafers were sent to Core Systems on 4/28/04.

04/28/04

Horvath