Step 16.0 Implanted S/D
activation
|
Steps |
Notes |
Date |
Operator |
|
16.1 |
Implanted S/D wafers only:
F# 1, 3, 7, 8, 11, 13, 14. + 2 implant test wafers Std. MOS clean wafers
piranha in sink9 (no HF dip) |
12/16/03 |
Horvath |
|
15.2 |
Rapid thermal annealing in
Heatpulse3. Recipe: -
450 °C, 30 sec -
1000 °C, 10 sec |
12/16-17/03 |
Horvath |
Note: Implantation caused
colorization faded away after the RTA.