Step 11.0 Resist strip and
clean
|
Steps |
Notes |
Date |
Operator |
|
11.1 |
Strip resist in Matrix (O2
plasma, 1.5 min) |
12/10/03 |
Horvath |
|
11.2 |
Std. clean wafers in
sink8, no HF dip. |
12/10/03 |
Horvath |
Note: Coloration of the implanted regions can be noticed