Step 44. Contact photo

Step	Process	Date	Operator
44.1	Std. DUV litho with BARC. Mask: 2nd modified CONT mask Focus-energy matrix on test wafer 40mJ, -0.35um Note1: Use higher energy to surely open up small (0.5um) contacts. This time 0.7um looks good. Note2: Check PM marks and put down new ones before developing if they look worn out. Oven bake for 1.5 hours @ 120C. (UVBAKE is down)	11/19/04	Horvath