Step 4. N-Well photo

Step	Process	Date	Operator
4.1	Std. DUV litho ASML: mask NWELL, 25mJ Hard bake: Oven bake 1hr (1 more hour after next nitride etch step) Resist thickness on dummy after hard bake: T= 7789A C= 7737A F= 7782A L= 7817A R= 7854A	08/07/03	Horvath