Step 38. N-type Gate and S/D implant photo

 

 

 

 

Step

 

Process

Date

Operator

38.1
Remove PR in O2 plasma in Technics-C (Matrix is down).
Clean wafers in sink8 piranha (MEMS)

 11/09/04
 Horvath

 

38.2

 

 

Std. DUV litho

Mask: 2nd modified N+S/D
27mJ, -0.6um

UVBAKE pr. J.

 

11/09/04

Horvath