Step 32. N-type LDD implant photo

 

 

 

 

Step

 

Process

Date

Operator

 

32.1

 

 

- Strip PR in O2 plasma (Matrix) for 1.5 min.
- Clean wafers in Sink8 MEMS piranha

- Std. DUV litho:

Mask: modified N+S/D
22mJ, -0.2um

UVBAKE pr. J.

 

10/18/04

Horvath