Step 28. Gate photo

 

 

 

 

Step

 

Process

Date

Operator

 

28.1

 

 

Std. DUV litho with BARC (unable to resolve small geometries without BARC)

Energy-Focus matrix: 21mJ, -0.2um were found the best.
Expose every wafer under these conditions.
Mask: POLY.

Hard bake: UVBAKE pr.U
(20sec @ 110C, 20sec ramp up to 140C, 30sec @ 140C with UV light HIGH)

Note: BARC coating partially resolved during the developing process (long expired BARC), leaving un-uniform surface (micron scaled BARC islands) on the developed area.

  

10/08/04

Horvath