Step 25. PMOS Vt adjustment implant photo
|
Step |
Process |
Date |
Operator |
25.1 |
Inspect wafers after implantation. Remove PR in Matrix Piranha clean in MEMS Sink8 |
09/16/04 |
Horvath
|
|
25.2 |
Std. DUV litho ASML: mask NWELL, 25mJ, 0um focus offset Hard bake: UVBAKE pr. JNote: Due to ASML laser problems w#1, 5 partially double exposed, w#7 completely double exposed (no image turned out after first exposure). All wafers look good. |
09/16/04 |
Horvath |