Step 23. NMOS Vt adjustment implant photo

 

 

 

 

Step

 

Process

Date

Operator

 

23.1

 

 

Std. DUV litho

ASML: mask PFIELD (inverse NWELL), 19mJ, 0um focus offset

 

Hard bake: UVBAKE pr. J

 

09/09/04

Horvath