Step 1. Initial oxidation
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Step
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Process |
Date |
Operator |
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Step 1.1
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TLC clean Tysar1 |
07/02/03 |
Horvath |
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Step 1.2
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Std. clean wafers in Sink 9. |
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Step 1.3
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Dry oxidation in Tystar1: 1GATEOXA, 950C, 30 min; 20 min N2 anneal
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Step 1.4
|
Measure oxide thickness with Nanoduv:
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