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Run Card for cmos150 |
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Step 41.0 |
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Process: Plasma etch Al in Lam3 |
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Operator |
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1. |
Lam3 is being upgraded. Estimated
downtime: one month.
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May 2, 2002 |
parsa, vorosl |
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Note: Wet aluminum etch was utilized for wafer #8. |
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etch time= 30 sec. (in sink7) |
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