|
|
Run Card for cmos150 |
|
Step 36.0 |
|
|
|
|
|
|
|
Process: Contact Photo: Mask CONT (CONT chrome-df) |
Date |
Operator |
|
|
|
|
|
|
|
Standard Lithography Process |
April
23rd , 2002 |
vorosl |
|
|
|
|
|
|
1. |
HMDS |
|
|
|
|
Program: 1 on svgcoat6 |
|
|
|
|
|
|
|
|
2. |
Spin and Soft Bake |
|
|
|
|
Program: 1 and 1 on svgcoat6 |
|
|
|
|
Photoresist: UV210-0.6 (Shipley) |
|
|
|
|
Thickness of PR: 7 000 A (RPM: 2000) |
|
|
|
|
|
|
|
|
3. |
Expose by ASML: Contact mask |
|
|
|
|
#3 exposed with 20 mJ/cm2, the rest with 30 mJ/cm2 |
|
|
|
4. |
Post exposure bake (Program: 1) |
|
|
|
|
|
|
|
|
5. |
Develop (Program: 1) |
|
|
|
|
|
|
|
|
6. |
Inspect, picture: |
|
|
|
|
|
|
|
|
7. |
Descum |
|
|
|
|
This step was skipped since there was no 6” tool for it. |
|
|
|
|
|
|
|
|
8. |
Hard Bake (oven) |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|