Run Card for cmos150

 

Step 11.0

 

 

 

 

 

Process: Active Area Photo - Mask Active (chrome-cf)

Date

Operator

 

 

 

 

 

Standard Lithography Process

 

 

 

 

 

1.

HMDS

09/28/01

vorosl

 

Program:1 on svgcoat6

 

 

 

 

 

 

2.

Spin and Soft Bake

09/28/01

vorosl

 

 

 

 

 

Two different groups:

 

 

 

#12-#15 (4000 A PR, Shipley-210-0.6, program 1)

 

 

 

#1-#10 (8000 A PR, Shipley UV-210-0.6, program 7)

 

 

 

 

Program #7 for SVGCOAT6:

Event

Operation

Arm

Time

Speed

Accel.

1

spin

0

10

0.5

50

2

spin

0

6

0

50

3

spin

0

3

0.5

50

4

spin

0

30

1.5

50

5

link to program #8

6

end

 

 

 

 

 

 

3.

Expose by ASML

09/28/01

vorosl,

 

Job name: baseline, active mask (4th quarter)

 

 

 

Energy matrix was accomplished to find the best resolution.

 

 

 

 

 

 

 

Energy= 18 mJ/cm2 for all except #9-#10 (19 mJ/cm2)

 

 

 

 

 

 

 

Note: Aperture was in.

 

 

 

#1, #4, #8, #12 were redone.

 

 

 

4.

Post exposure Bake (program:1) svgdev6

 

 

 

 

 

 

5.

Develop (program:1) svgdev6

 

 

 

 

 

 

6.

Inspect

 

vorosl

 

 

 

 

7.

Descum

 

 

 

This step was skipped, since there is no 6 tool for it yet.

 

 

 

 

 

 

8.

UV Bake (program: J)

 

vorosl